List of works - Seong Keun Kim

A Ru–Pt alloy electrode to suppress leakage currents of dynamic random-access memory capacitors

scientific article published on 30 August 2018

A differential method for measuring cooling performance of a thermoelectric module

A novel class of oxynitrides stabilized by nitrogen dimer formation

scientific article published in Scientific Reports

Advanced Silicon-on-Insulator: Crystalline Silicon on Atomic Layer Deposited Beryllium Oxide

scientific article published on 16 October 2017

Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

Asymmetry in electrical properties of Al-doped TiO2film with respect to bias voltage

article

Atomic Layer Deposition of Ru Thin Films Using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a Liquid Injection System

Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors

Atomic Layer Deposition of SrTiO3Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors

Atomic Layer Deposition of TiO[sub 2] Films on Ru Buffered TiN Electrode for Capacitor Applications

Atomic Layer Deposition of ZrO2 Thin Films with High Dielectric Constant on TiN Substrates

Atomic layer deposited HfO2 and HfO2/TiO2 bi-layer films using a heteroleptic Hf-precursor for logic and memory applications

Atomic layer deposition of HfO2 thin films using H2O2 as oxidant

Atomic layer deposition of TiO2 and Al-doped TiO2 films on Ir substrates for ultralow leakage currents

Atomic layer deposition of hafnium oxide from tert-butoxytris(ethylmethylamido)hafnium and ozone: rapid growth, high density and thermal stability

scholarly article by Minha Seo et al published 2008 in Journal of Materials Chemistry

Atomic-Layer Deposition of Single-Crystalline BeO Epitaxially Grown on GaN Substrates

scientific article published on 17 November 2017

Atomic-layer-deposited Al2O3 thin films with thin SiO2 layers grown by in situ O3 oxidation

Bio-fabrication of nanomesh channels of single-walled carbon nanotubes for locally gated field-effect transistors

scientific article published on 7 December 2016

Capacitance–voltage analysis of LaAlO3/SrTiO3 heterostructures

Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory

article published in 2010

Catalytic activity for oxygen reduction reaction on platinum-based core-shell nanoparticles: all-electron density functional theory.

scientific article published on 11 September 2015

Characteristics of a Capacitive Probe Array for Direct Surface Charge Detection

Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (≤100°C) using O3 as an oxygen source

Chemically Conformal ALD of SrTiO[sub 3] Thin Films Using Conventional Metallorganic Precursors

Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films

Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant

Confined polaronic transport in (LaFeO 3 ) n /(SrFeO 3 ) 1 superlattices

scientific article published in July 2019

Control of conducting filaments in TiO2 films by a thin interfacial conducting oxide layer at the cathode

Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment.

scientific article

Controlling the Al-doping profile and accompanying electrical properties of rutile-phased TiO2 thin films

scientific article published in May 2014

Controlling the Composition of Doped Materials by ALD: A Case Study for Al-Doped TiO[sub 2] Films

article

Correct extraction of frequency dispersion in accumulation capacitance in InGaAs metal-insulator-semiconductor devices

Correction of the Electrical and Thermal Extrinsic Effects in Thermoelectric Measurements by the Harman Method

scientific article published on 20 May 2016

Dynamic temperature response of electrocaloric multilayer capacitors

article

Effect of Mechanical Deformation on Thermoelectric Properties of p-Type(Bi0.225Sb0.775)2Te3Alloys

Effect of crystalline structure of TiO2 substrates on initial growth of atomic layer deposited Ru thin films

Effect of spark plasma sintering conditions on the thermoelectric properties of (Bi0.25Sb0.75)2Te3 alloys

Electric-field-induced shift in the threshold voltage in LaAlO3/SrTiO3 heterostructures

scientific article

Electrical properties of high-k HfO2 films on Si1−xGex substrates

article published in 2005

Electrically Benign Ru Wet Etching Method for Fabricating Ru∕TiO[sub 2]∕Ru Capacitor

Engineering of AlON interlayer in Al 2 O 3 /AlON/In 0.53 Ga 0.47 As gate stacks by thermal atomic layer deposition

Enhancement of Initial Growth of ZnO Films on Layer-Structured Bi2Te3 by Atomic Layer Deposition

Enhancement of Mechanical Hardness in SnOxNy with a Dense High-Pressure Cubic Phase of SnO2

Evaluating the top electrode material for achieving an equivalent oxide thickness smaller than 0.4 nm from an Al-doped TiO₂ film

scientific article published on 25 November 2014

Fabrication of a metal-oxide-semiconductor-type capacitive microtip array using SiO2 or HfO2 gate insulators

article published in 2004

Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films

article

Free-electron creation at the 60° twin boundary in Bi2Te3.

scientific article published on 16 August 2016

Giant Electroresistive Ferroelectric Diode on 2DEG

scientific article published on 27 May 2015

Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions

scientific article published on 17 November 2014

Growth Behavior of Al-Doped TiO2Thin Films by Atomic Layer Deposition

article published in 2008

Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications

Growth Enhancement and Nitrogen Loss in ZnOxNy Low-Temperature Atomic Layer Deposition with NH3

Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O3 as Oxygen Sources

Growth and Characterization of Conducting ZnO Thin Films by Atomic Layer Deposition

article published in 2010

Growth of RuO2Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4Precursor and 5% H2Reduction Gas

Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O

Hardening of Bi–Te based alloys by dispersing B 4 C nanoparticles

Harman Measurements for Thermoelectric Materials and Modules under Non-Adiabatic Conditions

scientific article published on 14 December 2016

High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

High mobility, large linear magnetoresistance, and quantum transport phenomena in Bi2Te3films grown by metallo-organic chemical vapor deposition (MOCVD)

article

High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrate

High-Performance Thin-Film Transistors of Quaternary Indium-Zinc-Tin Oxide Films Grown by Atomic Layer Deposition

scientific article published on 15 April 2019

Impact of Bimetal Electrodes on Dielectric Properties of TiO2 and Al-Doped TiO2 Films

scientific article published on 16 August 2012

Impact of parasitic thermal effects on thermoelectric property measurements by Harman method

scientific article published on 01 April 2014

Impedance-based interfacial analysis of the LaAlO3/SrTiO3 oxide heterostructure involving a 2-dimensional electron gas layer

Impedance-based interpretations in 2-dimensional electron gas conduction formed in the LaAlO 3 /Sr x Ca 1−x TiO 3 /SrTiO 3 system

Improved interface properties of atomic-layer-deposited HfO 2 film on InP using interface sulfur passivation with H 2 S pre-deposition annealing

Impurity-free, mechanical doping for the reproducible fabrication of the reliable n -type Bi 2 Te 3 -based thermoelectric alloys

Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials

Interfacial control of oxygen vacancy doping and electrical conduction in thin film oxide heterostructures.

scientific article published on 10 June 2016

Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition

article published in 2010

Laser-irradiated inclined metal nanocolumns for selective, scalable, and room-temperature synthesis of plasmonic isotropic nanospheres

article published in 2018

Leaky Integrate-and-Fire Neuron Circuit Based on Floating-Gate Integrator

scientific article published on 23 May 2016

Local Epitaxial Growth of Ru Thin Films by Atomic Layer Deposition at Low Temperature

article published in 2011

Low Temperature (<100°C) Deposition of Aluminum Oxide Thin Films by ALD with O[sub 3] as Oxidant

scholarly article by Seong Keun Kim et al published 2006 in Journal of the Electrochemical Society

Low-temperature wafer-scale synthesis of two-dimensional SnS2

scientific article published on 01 September 2018

Multiprotocol-induced plasticity in artificial synapses.

scientific article published on 6 November 2014

Non-volatile control of 2DEG conductivity at oxide interfaces

scientific article published on 27 June 2013

Nonvolatile resistance switching on two-dimensional electron gas.

scientific article published on 03 October 2014

Orientation-Controlled Growth of Pt Films on SrTiO3 (001) by Atomic Layer Deposition

Oxygen-Vacancy-Induced Polar Behavior in (LaFeO3)2/(SrFeO3) Superlattices

scientific article published on 18 April 2014

Permittivity Enhanced Atomic Layer Deposited HfO2Thin Films Manipulated by a Rutile TiO2Interlayer

article published in 2010

Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

article published in 2009

Polarity-tunable spin transport in all-oxide multiferroic tunnel junctions

scientific article published on 11 May 2016

Precision Interface Engineering of an Atomic Layer in Bulk Bi2Te3 Alloys for High Thermoelectric Performance

scientific article published on 10 June 2019

Reliability of neuronal information conveyed by unreliable neuristor-based leaky integrate-and-fire neurons: a model study

scientific article published on 13 May 2015

Role of Interfacial Reaction in Atomic Layer Deposition of TiO2Thin Films Using Ti(O-iPr)2(tmhd)2on Ru or RuO2Substrates

Sn doping in thermoelectric Bi2Te3 films by metal-organic chemical vapor deposition

SnO 2 thin films grown by atomic layer deposition using a novel Sn precursor

Strain-assisted, low-temperature synthesis of high-performance thermoelectric materials

scientific article published on 01 February 2014

Structurally and Electrically Uniform Deposition of High-k TiO[sub 2] Thin Films on a Ru Electrode in Three-Dimensional Contact Holes Using Atomic Layer Deposition

article published in 2005

Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes

scientific article published on 04 December 2014

Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time

Synthesis of SnS Thin Films by Atomic Layer Deposition at Low Temperatures

article published in 2017

Ta-Doped SnO2 as a reduction–resistant oxide electrode for DRAM capacitors

Texture-induced reduction in electrical resistivity of p-type (Bi,Sb)2Te3 by a hot extrusion

Thermoelectric Properties of Highly Deformed and Subsequently Annealed p-Type (Bi0.25Sb0.75)2Te3 Alloys

Thermoelectric Properties of Sn-Doped Bi0.4Sb1.6Te3 Thin Films

Thermopower Enhancement of Bi2Te3 Films by Doping I Ions

Thickness-Dependent Electrocaloric Effect in Pb0.9La0.1Zr0.65Ti0.35O3 Films Grown by Sol–Gel Process

Titanium dioxide thin films for next-generation memory devices

scholarly article by Seong Keun Kim et al published 19 July 2012 in Journal of Materials Research

Towards spin-polarized two-dimensional electron gas at a surface of an antiferromagnetic insulating oxide

scholarly article in Physical Review B, vol. 94 no. 4, July 2016

Transformation of the Crystalline Structure of an ALD TiO[sub 2] Film on a Ru Electrode by O[sub 3] Pretreatment

Wafer-Scale, Conformal, and Low-Temperature Synthesis of Layered Tin Disulfides for Emerging Nonplanar and Flexible Electronics

scientific article published on 02 January 2020

Wafer-scale growth of MoS2 thin films by atomic layer deposition.

scientific article published on 11 May 2016

Wall-thickness-dependent strength of nanotubular ZnO

scientific article

X-ray irradiation induced reversible resistance change in Pt/TiO2/Pt cells

scientific article

List of works by Seong Keun Kim

A Ru–Pt alloy electrode to suppress leakage currents of dynamic random-access memory capacitors

A differential method for measuring cooling performance of a thermoelectric module

A novel class of oxynitrides stabilized by nitrogen dimer formation

Advanced Silicon-on-Insulator: Crystalline Silicon on Atomic Layer Deposited Beryllium Oxide

Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

Asymmetry in electrical properties of Al-doped TiO2film with respect to bias voltage

Atomic Layer Deposition of Ru Thin Films Using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a Liquid Injection System

Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors

Atomic Layer Deposition of SrTiO3Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors

Atomic Layer Deposition of TiO[sub 2] Films on Ru Buffered TiN Electrode for Capacitor Applications

Atomic Layer Deposition of ZrO2 Thin Films with High Dielectric Constant on TiN Substrates

Atomic layer deposited HfO2 and HfO2/TiO2 bi-layer films using a heteroleptic Hf-precursor for logic and memory applications

Atomic layer deposition of HfO2 thin films using H2O2 as oxidant

Atomic layer deposition of TiO2 and Al-doped TiO2 films on Ir substrates for ultralow leakage currents

Atomic layer deposition of hafnium oxide from tert-butoxytris(ethylmethylamido)hafnium and ozone: rapid growth, high density and thermal stability

Atomic-Layer Deposition of Single-Crystalline BeO Epitaxially Grown on GaN Substrates

Atomic-layer-deposited Al2O3 thin films with thin SiO2 layers grown by in situ O3 oxidation

Bio-fabrication of nanomesh channels of single-walled carbon nanotubes for locally gated field-effect transistors

Capacitance–voltage analysis of LaAlO3/SrTiO3 heterostructures

Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory

Catalytic activity for oxygen reduction reaction on platinum-based core-shell nanoparticles: all-electron density functional theory.

Characteristics of a Capacitive Probe Array for Direct Surface Charge Detection

Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (≤100°C) using O3 as an oxygen source

Chemically Conformal ALD of SrTiO[sub 3] Thin Films Using Conventional Metallorganic Precursors

Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films

Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant

Confined polaronic transport in (LaFeO 3 ) n /(SrFeO 3 ) 1 superlattices

Control of conducting filaments in TiO2 films by a thin interfacial conducting oxide layer at the cathode

Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment.

Controlling the Al-doping profile and accompanying electrical properties of rutile-phased TiO2 thin films

Controlling the Composition of Doped Materials by ALD: A Case Study for Al-Doped TiO[sub 2] Films

Correct extraction of frequency dispersion in accumulation capacitance in InGaAs metal-insulator-semiconductor devices

Correction of the Electrical and Thermal Extrinsic Effects in Thermoelectric Measurements by the Harman Method

Dynamic temperature response of electrocaloric multilayer capacitors

Effect of Mechanical Deformation on Thermoelectric Properties of p-Type(Bi0.225Sb0.775)2Te3Alloys

Effect of crystalline structure of TiO2 substrates on initial growth of atomic layer deposited Ru thin films

Effect of spark plasma sintering conditions on the thermoelectric properties of (Bi0.25Sb0.75)2Te3 alloys

Electric-field-induced shift in the threshold voltage in LaAlO3/SrTiO3 heterostructures

Electrical properties of high-k HfO2 films on Si1−xGex substrates

Electrically Benign Ru Wet Etching Method for Fabricating Ru∕TiO[sub 2]∕Ru Capacitor

Engineering of AlON interlayer in Al 2 O 3 /AlON/In 0.53 Ga 0.47 As gate stacks by thermal atomic layer deposition

Enhancement of Initial Growth of ZnO Films on Layer-Structured Bi2Te3 by Atomic Layer Deposition

Enhancement of Mechanical Hardness in SnOxNy with a Dense High-Pressure Cubic Phase of SnO2

Evaluating the top electrode material for achieving an equivalent oxide thickness smaller than 0.4 nm from an Al-doped TiO₂ film

Fabrication of a metal-oxide-semiconductor-type capacitive microtip array using SiO2 or HfO2 gate insulators

Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films

Free-electron creation at the 60° twin boundary in Bi2Te3.

Giant Electroresistive Ferroelectric Diode on 2DEG

Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions

Growth Behavior of Al-Doped TiO2Thin Films by Atomic Layer Deposition

Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications

Growth Enhancement and Nitrogen Loss in ZnOxNy Low-Temperature Atomic Layer Deposition with NH3

Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O3 as Oxygen Sources

Growth and Characterization of Conducting ZnO Thin Films by Atomic Layer Deposition

Growth of RuO2Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4Precursor and 5% H2Reduction Gas

Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O

Hardening of Bi–Te based alloys by dispersing B 4 C nanoparticles

Harman Measurements for Thermoelectric Materials and Modules under Non-Adiabatic Conditions

High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition

High mobility, large linear magnetoresistance, and quantum transport phenomena in Bi2Te3films grown by metallo-organic chemical vapor deposition (MOCVD)

High quality interfacial sulfur passivation via H2S pre-deposition annealing for an atomic-layer-deposited HfO2 film on a Ge substrate

High-Performance Thin-Film Transistors of Quaternary Indium-Zinc-Tin Oxide Films Grown by Atomic Layer Deposition

Impact of Bimetal Electrodes on Dielectric Properties of TiO2 and Al-Doped TiO2 Films

Impact of parasitic thermal effects on thermoelectric property measurements by Harman method

Impedance-based interfacial analysis of the LaAlO3/SrTiO3 oxide heterostructure involving a 2-dimensional electron gas layer

Impedance-based interpretations in 2-dimensional electron gas conduction formed in the LaAlO 3 /Sr x Ca 1−x TiO 3 /SrTiO 3 system

Improved interface properties of atomic-layer-deposited HfO 2 film on InP using interface sulfur passivation with H 2 S pre-deposition annealing

Impurity-free, mechanical doping for the reproducible fabrication of the reliable n -type Bi 2 Te 3 -based thermoelectric alloys

Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials

Interfacial control of oxygen vacancy doping and electrical conduction in thin film oxide heterostructures.

Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition

Laser-irradiated inclined metal nanocolumns for selective, scalable, and room-temperature synthesis of plasmonic isotropic nanospheres

Leaky Integrate-and-Fire Neuron Circuit Based on Floating-Gate Integrator

Local Epitaxial Growth of Ru Thin Films by Atomic Layer Deposition at Low Temperature

Low Temperature (<100°C) Deposition of Aluminum Oxide Thin Films by ALD with O[sub 3] as Oxidant

Low-temperature wafer-scale synthesis of two-dimensional SnS2

Multiprotocol-induced plasticity in artificial synapses.

Non-volatile control of 2DEG conductivity at oxide interfaces

Nonvolatile resistance switching on two-dimensional electron gas.