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List of works by Oihane Beldarrain

2 MeV electron irradiation effects on the electrical characteristics of metal–oxide–silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics

2MeV electron irradiation effects on bulk and interface of atomic layer deposited high-k gate dielectrics on silicon

2MeV electron irradiation effects on the electrical characteristics of MOS capacitors with ALD Al2O3 dielectrics of different thickness

Blistering of atomic layer deposition Al2O3 layers grown on silicon and its effect on metal–insulator–semiconductor structures

Charge trapping analysis of Al2O3 films deposited by atomic layer deposition using H2O or O3 as oxidant

Charge trapping and electrical degradation in atomic layer deposited Al2O3 films

Comparison between Al 2 O 3 thin films grown by ALD using H 2 O or O 3 as oxidant source

Defect assessment and leakage control in atomic layer deposited Al 2 O 3 and HfO 2 dielectrics

Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

Effect of Processing Conditions on the Electrical Characteristics of Atomic Layer Deposited Al

Effect of the blistering of ALD Al 2 O 3 films on the silicon surface in Al-Al 2 O 3 -Si structures

article published in 2015

Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2O3, HfO2, and nanolaminates on different silicon substrates

Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing

scholarly article by Hector Garcia et al published January 2013 in Journal of Vacuum Science & Technology A

Electron Irradiation Effects on Atomic Layer Deposited High-k Gate Dielectrics

Impact of electrical stress on the electrical characteristics of 2MeV electron irradiated metal-oxide-silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics

Investigation of the resistive switching behavior in Ni/HfO 2 -based RRAM devices

Quantized bands model for the determination of the dielectric constant of high-κ layers

Thin dielectric films grown by atomic layer deposition: Properties and applications

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