193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study

193nm resist chemical modification induced by HBr cure plasma treatment: a TD-GC/MS outgassing study

193nm resist deprotection study from outgassing measurements by TD-GCMS/FID

300mm pilot line DSA contact hole process stability

A route for industry compatible directed self-assembly of high-chi PS-PDMS block copolymers

A track process for solvent annealing of high-χ BCPs

Advanced surface affinity control for DSA contact hole shrink applications

An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly

scientific article published on 01 June 2018

Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach

Blending approaches to enhance structural order in block-copolymer's self-assemblies

Block copolymer selectivity: A new dry etch approach for cylindrical applications

Block copolymer technology applied to nanoelectronics

Characteristics of TLD-100 Fading and its Influence on the Calibration of Personal Dosemeters

Chemically amplified photoresists for 193-nm photolithography: Effect of molecular structure and photonic parameters on photopatterning

Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances

scholarly article published 17 October 2014

Contact hole shrink and multiplication by directed self-assembly of block copolymers: from material to integration

Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line

Contact holes patterning by directed self-assembly of block copolymers: What would be the Bossung plot?

Contact holes patterning by directed self-assembly of block copolymers: process window study

Continuous evolution of lithographic films through process steps: an example with 193 chemically amplified resists

DNA Origami Mask for Sub-Ten-Nanometer Lithography.

scientific article published on 10 June 2016

DSA planarization approach to solve pattern density issue

DSA process window expansion with novel DSA track hardware

Design of new block copolymer systems to achieve thick films with defect-free structures for applications of DSA into lithographic large nodes

Development and integration of systems with enhanced resolutions based on Si-containing block copolymers for line space applications

Development of organic resistive memory for flexible electronics

article

Epitaxially-induced perpendicular anisotropy in manganite films

Etch challenges for DSA implementation in CMOS via patterning

Fabrication and characterisation of nanoscale programmed defects for EUV lithography

Fabrication of monodisperse magnetic nanoparticles released in solution using a block copolymer template

Free surface BCP self-assembly process characterization with CDSEM

Future challenges and opportunities for heterogeneous process technology. Towards the thin films, Zero Intrinsic Variability devices, Zero Power era

Gaussian beam writing strategy: accuracy of using the shape beam simulator SELID for Gaussian beam systems

Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers

Guided self-assembly of block-copolymer for CMOS technology: a comparative study between grapho-epitaxy and surface chemical modification

HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness

Hexacyanometalate molecular chemistry: trinuclear CrNi 2 complexes; micro-SQUID magnetisation studies of intermolecular interactions

article by Raluca Tiron et al published July 2003 in Polyhedron

Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

article published in 2009

Impact of molecular structure of polymer in 193nm resist performance

Improvements of self-assembly properties via homopolymer addition or block-copolymer blends

article

Investigation of block depth distribution in PS-b-PMMA block copolymer using ultra-low-energy cesium sputtering in ToF-SIMS

Investigation of coat-develop track system for placement error of contact hole shrink process

Investigation of fullerene depth distribution in PMMA-C60 blends using dual beam ToF-SIMS

Investigation of the TiN/photoresist interface degradation during a wet etch

Latest evolution in a 300mm graphoepitaxy pilot line flow for L/S applications

Mechanical dynamical analysis of ultra thin resist films for microlithography applications

Metallic Conductive Nanowires Elaborated by PVD Metal Deposition on Suspended DNA Bundles.

scientific article

Nanoimprint, DSA, and multi-beam lithography: patterning technologies with new integration challenges

Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study

PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication

article by Ahmed Gharbi et al published September 2015 in Journal of vacuum science and technology. B, Nanotechnology & microelectronics : materials, processing, measurement, & phenomena : JVST B

PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications

PMMA removal selectivity to PS using dry etch approach: sub-10nm patterning application

PMMA removal selectivity to polystyrene using dry etch approach

Pattern density multiplication by direct self assembly of block copolymers: toward 300mm CMOS requirements

Pillars fabrication by DSA lithography: material and process options

article published in 2018

Placement error in directed self-assembly of block copolymers for contact hole application

Plasma Enhanced Chemical Vapor Deposition of Conformal GeTe Layer for Phase Change Memory Applications

Plasma etching and integration challenges using alternative patterning techniques for 11nm node and beyond

Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications

Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X-ray Scattering: The Attractive Case of Graphoepitaxy

article published in 2014

Process highlights to enhance DSA contact patterning performances

Process highlights to enhance directed self-assembly contact patterning performances

Quantum dynamics of exchange biased single-molecule magnets

article

Quantum tunneling in a three-dimensional network of exchange-coupled single-molecule magnets

scholarly article in Physical Review B, vol. 68 no. 14, October 2003

Recent Achievements in Sub-10 nm DSA Lithography for Line/Space Patterning

Removal of poly(methyl methacrylate) in diblock copolymers films studied by grazing incidence small-angle X-ray scattering

Resist and BARC outgassing measured by TD-GCMS: investigation during the exposure or the bake steps of the lithographic process

Resist evaluation for contact hole patterning with thermal flow process

Resist outgassing assessment for multi electron beams lithography

Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)

Scaling-down lithographic dimensions with block-copolymer materials: 10nmsized features with PS-b-PMMA

Self-assembly of Si-containing block copolymers with high-segregation strength: toward sub-10nm features in directed self-assembly

Self-assembly of high-resolutions PS-b-PMMA block-copolymers: processes capabilities and integration on 300mm track

Self-assembly patterning using block copolymer for advanced CMOS technology: optimisation of plasma etching process

Spin Quantum Tunneling via Entangled States in a Dimer of Exchange-Coupled Single-Molecule Magnets

scientific article published in Physical Review Letters

Spin-Spin Cross Relaxation in Single-Molecule Magnets

scientific article published in Physical Review Letters

Strain-induced magnetic anisotropy in epitaxial manganite films

Study and optimization of the parameters governing the block copolymer self-assembly: toward a future integration in lithographic process

Study of Etchants’ Diffusion into a 248 nm Deep UV Photoresist during a Wet Etch

Study of dynamical formation and shape of microlenses formed by the reflow method

Surface Preparations Impact on 248nm Deep UV Photo Resists Adhesion during a Wet Etch

Surface affinity role in graphoepitaxy of lamellar block copolymers

Surface affinity role in graphoepitaxy of lamellar block copolymers

Synthesis of mono disperse magnetic nanoparticles prepared on block copolymer templates for medical imaging techniques

scholarly article published May 2015

Template affinity role in CH shrink by DSA planarization

The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication

Two-body tunnel transitions in a Mn4 single-molecule magnet

Ultrahigh-resolution pattern using electron-beam lithography HF wet etching

Wet Etchant Diffusion through Photoresist during Gate Oxide Patterning