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List of works by Harish Parala

A novel preparation of nano-Cu/ZnO by photo-reduction of Cu(OCH(Me)CH2NMe2)2 on ZnO at room temperature

scientific article published on 01 January 2003

Atomic Layer Deposition of Gd2O3 and Dy2O3: A Study of the ALD Characteristics and Structural and Electrical Properties

article published in 2012

Atomic Layer Deposition of HfO2 Thin Films Employing a Heteroleptic Hafnium Precursor

scholarly article by Ke Xu et al published March 2012 in Chemical Vapor Deposition

Atomic Vapor Deposition Approach to In 2 O 3 Thin Films

article

Deposition of Niobium Nitride Thin Films fromTert-Butylamido-Tris-(Diethylamido)-Niobium by a Modified Industrial MOCVD Reactor

scholarly article by Tobias B. Thiede et al published December 2009 in Chemical Vapor Deposition

Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors

scholarly article by Anjana Devi et al published 9 June 2010 in Chemical Vapor Deposition

Growth of crystalline Gd2O3 thin films with a high-quality interface on Si(100) by low-temperature H2O-assisted atomic layer deposition

scientific article published on 01 January 2010

Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition

article

Investigations on InN whiskers grown by chemical vapour deposition

article published in 2001

Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors

MOCVD-loading of mesoporous siliceous matrices with Cu/ZnO: supported catalysts for methanol synthesis

scientific article published on 01 May 2004

Mixed amido/imido/guanidinato complexes of niobium: potential precursors for MOCVD of niobium nitride thin films.

scientific article published on 2 June 2008

Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin films.

scientific article published in January 2009

Rare-Earth Based Oxide and Nitride Thin Films Employing Volatile Homoleptic Guanidinate Precursors

Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition

Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors.

scientific article

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