List of works - Massimo Tallarida

(Invited) III-V/Oxide Interfaces Investigated with Synchrotron Radiation Photoemission Spectroscopy

A facile corrosion approach to the synthesis of highly active CoOx water oxidation catalysts

scientific article published in 2017

ALD on High Mobility Channels: Engineering the Proper Gate Stack Passivation

article

Atom-specific identification of adsorbed chiral molecules by photoemission.

scientific article published on 2 September 2005

Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

scholarly article by Aile Tamm et al published 2010 in Journal of the Electrochemical Society

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

scholarly article by Kaupo Kukli et al published 2011 in Journal of the Electrochemical Society

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films.

scientific article published on 8 November 2013

GaAs clean up studied with synchrotron radiation photoemission

Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides

scientific article published on 03 June 2015

Growth of TiO2 with thermal and plasma enhanced atomic layer deposition

scientific article published on 01 September 2011

Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodes

scientific article published on 7 October 2014

New insights into water photooxidation on reductively pretreated hematite photoanodes

scientific article

On the scalability of doped hafnia thin films

Operando NAP-XPS Studies of a Ceria-Supported Pd Catalyst for CO Oxidation

scientific article published on 20 December 2022

Quantum size effects in TiO2 thin films grown by atomic layer deposition.

scientific article published on 22 January 2014

Sacrificial Self-Assembled Monolayers for the Passivation of GaAs (100) Surfaces and Interfaces

Si microstructures laminated with a nanolayer of TiO2 as long-term stable and effective photocathodes in PEC devices.

scientific article published in May 2015

Study of InP Surfaces after Wet Chemical Treatments

Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide

article published in 2013

Surface Functionalization of Nanostructured Fe2O3 Polymorphs: From Design to Light-Activated Applications

scientific article published on 12 July 2013

Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum

scholarly article by Massimo Tallarida et al published 25 July 2011 in Applied Physics Letters

List of works by Massimo Tallarida

(Invited) III-V/Oxide Interfaces Investigated with Synchrotron Radiation Photoemission Spectroscopy

A facile corrosion approach to the synthesis of highly active CoOx water oxidation catalysts

ALD on High Mobility Channels: Engineering the Proper Gate Stack Passivation

Atom-specific identification of adsorbed chiral molecules by photoemission.

Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films.

GaAs clean up studied with synchrotron radiation photoemission

Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides

Growth of TiO2 with thermal and plasma enhanced atomic layer deposition

Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodes

New insights into water photooxidation on reductively pretreated hematite photoanodes

On the scalability of doped hafnia thin films

Operando NAP-XPS Studies of a Ceria-Supported Pd Catalyst for CO Oxidation

Quantum size effects in TiO2 thin films grown by atomic layer deposition.

Sacrificial Self-Assembled Monolayers for the Passivation of GaAs (100) Surfaces and Interfaces

Si microstructures laminated with a nanolayer of TiO2 as long-term stable and effective photocathodes in PEC devices.

Study of InP Surfaces after Wet Chemical Treatments

Study of InP Surfaces after Wet Chemical Treatments

Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide

Surface Functionalization of Nanostructured Fe2O3 Polymorphs: From Design to Light-Activated Applications

Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum