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List of works by Kaupo Kukli

(Ta1−xNbx)2O5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I–V characteristics

A low valent metalorganic precursor for the growth of tungsten nitride thin films by atomic layer deposition

scientific article

Analytical TEM characterization of the interfacial layer between ALD HfO2 film and silicon substrate

scientific article published in January 2005

Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

scholarly article by Aile Tamm et al published 2010 in Journal of the Electrochemical Society

Atomic Layer Deposition and Chemical Vapor Deposition of Tantalum Oxide by Successive and Simultaneous Pulsing of Tantalum Ethoxide and Tantalum Chloride

scholarly article by Kaupo Kukli et al published July 2000 in Chemistry of Materials

Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films

scholarly article by Kaupo Kukli et al published March 2006 in Chemical Vapor Deposition

Atomic Layer Deposition of Hafnium Dioxide Films Using Hafnium Bis(2-butanolate)bis(1-methoxy-2-methyl-2-propanolate) and Water

article

Atomic Layer Deposition of Hafnium Dioxide Films from 1-Methoxy-2-methyl-2-propanolate Complex of Hafnium

scholarly article by Kaupo Kukli et al published April 2003 in Chemistry of Materials

Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water

scholarly article by Kaupo Kukli et al published March 2004 in Chemical Vapor Deposition

Atomic Layer Deposition of High-Permittivity Yttrium-Doped HfO[sub 2] Films

article

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

scholarly article by Kaupo Kukli et al published 2011 in Journal of the Electrochemical Society

Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor

scientific article published on 21 December 2000

Atomic layer deposition and properties of ZrO2/Fe2O3 thin films.

scientific article published on 10 January 2018

Atomic layer deposition of Al2O3, ZrO2, Ta2O5, and Nb2O5 based nanolayered dielectrics

Atomic layer deposition of HfO2 thin films and nanolayered HfO2–Al2O3–Nb2O5 dielectrics

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Atomic layer deposition of calcium oxide and calcium hafnium oxide films using calcium cyclopentadienyl precursor

scholarly article by Kaupo Kukli et al published April 2006 in Thin Solid Films

Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

scholarly article by Kaupo Kukli et al published November 2005 in Thin Solid Films

Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources

scientific article

Atomic layer deposition of polycrystalline HfO2 films by the HfI4–O2 precursor combination

scientific article published in March 2003

Atomic layer deposition of ruthenium films on strontium titanate

scientific article published on 01 September 2011

Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

scholarly article by Kaupo Kukli et al published September 2002 in Thin Solid Films

Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates

scientific article published in June 2008

Crystallization in hafnia- and zirconia-based systems

Dielectric Permittivity and Intercalation Parameters of Li Ion Intercalated Atomic Layer Deposited ZrO[sub 2]

Effect of preparation conditions on properties of atomic layer deposited TiO2 films in Mo–TiO2–Al stacks

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

scholarly article by Kaupo Kukli et al published November 2004 in Journal of Applied Physics

Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]

scholarly article by Kaupo Kukli et al published May 2005 in Journal of Applied Physics

Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films

article

Evaluation of a Praseodymium Precursor for Atomic Layer Deposition of Oxide Dielectric Films

scholarly article by Kaupo Kukli et al published November 2004 in Chemistry of Materials

Hafnium silicon oxide films prepared by atomic layer deposition

scholarly article by Kaupo Kukli et al published June 2004 in Materials Science and Engineering B: Advanced Functional Solid-state Materials

Hafnium tetraiodide and oxygen as precursors for atomic layer deposition of hafnium oxide thin films

scholarly article by Jaan Aarik et al published October 2002 in Thin Solid Films

HfO[sub 2] Films Grown by ALD Using Cyclopentadienyl-Type Precursors and H[sub 2]O or O[sub 3] as Oxygen Source

scientific article

High Growth Rate of Erbium Oxide Thin Films in Atomic Layer Deposition from (CpMe)3Er and Water Precursors

scientific article

Inert ambient annealing effect on MANOS capacitor memory characteristics

scientific article published on 12 March 2015

Influence of TiO2 incorporation in HfO2 and Al2O3 based capacitor dielectrics

scientific article published in June 2007

Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon

scholarly article by Kaupo Kukli et al published May 2002 in Thin Solid Films

Investigation of ZrO[sub 2]–Gd[sub 2]O[sub 3] Based High-k Materials as Capacitor Dielectrics

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films

scientific article published on 11 December 2017

Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodes

scientific article published on 7 October 2014

Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides

scholarly article by Helina Seemen et al published 2018 in ECS Journal of Solid State Science and Technology

Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water

scholarly article by Kaupo Kukli et al published 2004 in Journal of the Electrochemical Society

Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

scholarly article by Kaupo Kukli et al published 15 November 2002 in Journal of Applied Physics

Properties of tantalum oxide thin films grown by atomic layer deposition

scholarly article by Kaupo Kukli et al published May 1995 in Thin Solid Films

Thin film nanolaminate analysis by simultaneous heavy ion recoil and X-ray spectrometry

ZrO2 Thin Films Grown on Silicon Substrates by Atomic Layer Deposition with Cp2Zr(CH3)2 and Water as Precursors

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