List of works - Mikko Laitinen

A new beamline for energy-dispersive high-resolution PIXE analysis using polycapillary optics

scientific article

ALD Grown Aluminum Oxide Submonolayers in Dye-Sensitized Solar Cells: The Effect on Interfacial Electron Transfer and Performance

scientific article

Advanced time-stamped total data acquisition control front-end for MeV ion beam microscopy and proton beam writing

Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et3Si)3As through the GaAs process

article published in 2016

Alpha-particle capture reactions in inverse kinematics relevant to p-process nucleosynthesis

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

scholarly article by Oili M.E. Ylivaara et al published February 2014 in Thin Solid Films

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

scholarly article by Oili M. E. Ylivaara et al published January 2017 in Journal of Vacuum Science & Technology A

Application of Calorimetric Low Temperature Detectors (CLTD’s) for Precise Stopping Power Measurements of Heavy Ions in Matter

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

scholarly article by Kaupo Kukli et al published 2011 in Journal of the Electrochemical Society

Atomic Layer Deposition of Spinel Lithium Manganese Oxide by Film-Body-Controlled Lithium Incorporation for Thin-Film Lithium-Ion Batteries

Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

scholarly article by Ville Miikkulainen et al published January 2015 in Journal of Vacuum Science & Technology A

Atomic layer deposition of LixTiyOz thin films

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Broadband Ultrahigh-Resolution Spectroscopy of Particle-Induced X Rays: Extending the Limits of Nondestructive Analysis

article

Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Films

Coating and functionalization of high density ion track structures by atomic layer deposition

Control of Oxygen Nonstoichiometry and Magnetic Property of MnCo2O4Thin Films Grown by Atomic Layer Deposition

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

scientific article published on 01 September 2011

Correction to “Atomic Layer Deposition of Spinel Lithium Manganese Oxide by Film-Body-Controlled Lithium Incorporation for Thin-Film Lithium-Ion Batteries”

scholarly article published in Journal of Physical Chemistry C

Depth profiling of Al2O3+TiO2 nanolaminates by means of a time-of-flight energy spectrometer

article published in 2011

Development Of PIXE Measurement Of Ca Changes Resulting From Viral Transduction In Cells

Development of an MeV ion beam lithography system in Jyväskylä

Development of micro-contact printing of osteosarcoma cells using MeV ion beam lithography

article

Development of the Jyväskylä microbeam facility

Direct Writing of Channels for Microfluidics in Silica by MeV Ion Beam Lithography

article published in 2011

Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al 2 O 3

Energy loss and straggling of MeV Si ions in gases

Energy-loss straggling of 2–10 MeV/u Kr ions in gases

scholarly article in European Physical Journal D, vol. 67 no. 7, July 2013

Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3

Experimental evidence on photo-assisted O− ion production from Al2O3 cathode in cesium sputter negative ion source

scientific article

Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

Heavy ion induced Ti X-ray satellite structure for Ti, TiN, and TiO2 thin films

Influence of titanium-substrate roughness on Ca–P–O thin films grown by atomic layer deposition

scholarly article by A.R. Ananda Sagari et al published March 2013 in Thin Solid Films

Investigation Of Multi-Resolution Support For MeV Ion Microscopy Imaging

Ion-sputtering deposition of Ca–P–O films for microscopic imaging of osteoblast cells

Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions

Minimum detection limits and applications of proton and helium induced X-ray emission using transition-edge sensor array

Mobility determination of lead isotopes in glass for retrospective radon measurements.

scientific article

Nanoscale Etching of GaAs and InP in Acidic H 2 O 2 Solution: A Striking Contrast in Kinetics and Surface Chemistry

Nanoscale etching of III-V semiconductors in acidic hydrogen peroxide solution: GaAs and InP, a striking contrast in surface chemistry

Ozone-Based Atomic Layer Deposition of Al2 O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation

Photo-assisted O− and Al− production with a cesium sputter ion source

scientific article

Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

scholarly article by Alexander Pyymaki Perros et al published January 2012 in Journal of Vacuum Science & Technology A

Porous inorganic–organic hybrid material by oxygen plasma treatment

article

Production of pure 133mXe for CTBTO

Production of pure samples of 131mXe and 135Xe

scientific article published on 17 September 2012

Programmable proximity aperture lithography with MeV ion beams

Properties of AlN grown by plasma enhanced atomic layer deposition

Recent negative ion source activity at JYFL

Secondary electron flight times and tracks in the carbon foil time pick-up detector

Stability, sub-gap current, 1/f-noise, and elemental depth profiling of annealed Al:Mn-AlOX-Al normal metal-insulator-superconducting tunnel junctions

scholarly article by J. K. Julin et al published December 2016 in AIP Advances

Stabilizing organic photocathodes by low-temperature atomic layer deposition of TiO2

article

Tang dynasty (618–907) bowl measured with PIXE

Time-of-flight ERD with a 200mm2 Si3N4 window gas ionization chamber energy detector

Time-of-flight – Energy spectrometer for elemental depth profiling – Jyväskylä design

article by Mikko Laitinen et al published October 2014 in Nuclear Instruments & Methods in Physics Research B

Trajectory bending and energy spreading of charged ions in time-of-flight telescopes used for ion beam analysis

Transition-Edge Sensors for Particle Induced X-ray Emission Measurements

article

Ultra-high resolution mass separator—Application to detection of nuclear weapons tests

scientific article published on 16 December 2009

Variation of lattice constant and cluster formation in GaAsBi

article

Wettability and compositional analysis of hydroxyapatite films modified by low and high energy ion irradiation

article

List of works by Mikko Laitinen

A new beamline for energy-dispersive high-resolution PIXE analysis using polycapillary optics

ALD Grown Aluminum Oxide Submonolayers in Dye-Sensitized Solar Cells: The Effect on Interfacial Electron Transfer and Performance

Advanced time-stamped total data acquisition control front-end for MeV ion beam microscopy and proton beam writing

Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et3Si)3As through the GaAs process

Alpha-particle capture reactions in inverse kinematics relevant to p-process nucleosynthesis

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Application of Calorimetric Low Temperature Detectors (CLTD’s) for Precise Stopping Power Measurements of Heavy Ions in Matter

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

Atomic Layer Deposition of Spinel Lithium Manganese Oxide by Film-Body-Controlled Lithium Incorporation for Thin-Film Lithium-Ion Batteries

Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

Atomic layer deposition of LixTiyOz thin films

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Broadband Ultrahigh-Resolution Spectroscopy of Particle-Induced X Rays: Extending the Limits of Nondestructive Analysis

Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Films

Coating and functionalization of high density ion track structures by atomic layer deposition

Control of Oxygen Nonstoichiometry and Magnetic Property of MnCo2O4Thin Films Grown by Atomic Layer Deposition

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

Correction to “Atomic Layer Deposition of Spinel Lithium Manganese Oxide by Film-Body-Controlled Lithium Incorporation for Thin-Film Lithium-Ion Batteries”

Depth profiling of Al2O3+TiO2 nanolaminates by means of a time-of-flight energy spectrometer

Development Of PIXE Measurement Of Ca Changes Resulting From Viral Transduction In Cells

Development of an MeV ion beam lithography system in Jyväskylä

Development of micro-contact printing of osteosarcoma cells using MeV ion beam lithography

Development of the Jyväskylä microbeam facility

Direct Writing of Channels for Microfluidics in Silica by MeV Ion Beam Lithography

Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al 2 O 3

Energy loss and straggling of MeV Si ions in gases

Energy-loss straggling of 2–10 MeV/u Kr ions in gases

Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3

Experimental evidence on photo-assisted O− ion production from Al2O3 cathode in cesium sputter negative ion source

Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

Heavy ion induced Ti X-ray satellite structure for Ti, TiN, and TiO2 thin films

Influence of titanium-substrate roughness on Ca–P–O thin films grown by atomic layer deposition

Investigation Of Multi-Resolution Support For MeV Ion Microscopy Imaging

Ion-sputtering deposition of Ca–P–O films for microscopic imaging of osteoblast cells

Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions

Minimum detection limits and applications of proton and helium induced X-ray emission using transition-edge sensor array

Mobility determination of lead isotopes in glass for retrospective radon measurements.

Nanoscale Etching of GaAs and InP in Acidic H 2 O 2 Solution: A Striking Contrast in Kinetics and Surface Chemistry

Nanoscale etching of III-V semiconductors in acidic hydrogen peroxide solution: GaAs and InP, a striking contrast in surface chemistry

Ozone-Based Atomic Layer Deposition of Al2 O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation

Photo-assisted O− and Al− production with a cesium sputter ion source

Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

Porous inorganic–organic hybrid material by oxygen plasma treatment

Production of pure 133mXe for CTBTO

Production of pure samples of 131mXe and 135Xe

Programmable proximity aperture lithography with MeV ion beams

Properties of AlN grown by plasma enhanced atomic layer deposition

Recent negative ion source activity at JYFL

Secondary electron flight times and tracks in the carbon foil time pick-up detector

Stability, sub-gap current, 1/f-noise, and elemental depth profiling of annealed Al:Mn-AlOX-Al normal metal-insulator-superconducting tunnel junctions

Stabilizing organic photocathodes by low-temperature atomic layer deposition of TiO2

Tang dynasty (618–907) bowl measured with PIXE

Time-of-flight ERD with a 200mm2 Si3N4 window gas ionization chamber energy detector

Time-of-flight – Energy spectrometer for elemental depth profiling – Jyväskylä design

Trajectory bending and energy spreading of charged ions in time-of-flight telescopes used for ion beam analysis

Transition-Edge Sensors for Particle Induced X-ray Emission Measurements

Ultra-high resolution mass separator—Application to detection of nuclear weapons tests

Variation of lattice constant and cluster formation in GaAsBi

Wettability and compositional analysis of hydroxyapatite films modified by low and high energy ion irradiation

Why are hydrogen ions best for MeV ion beam lithography?