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List of works by Timo Sajavaara

12th European Conference on Accelerators in Applied Research and Technology

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

scientific article

A new beamline for energy-dispersive high-resolution PIXE analysis using polycapillary optics

scientific article

A round robin characterisation of the thickness and composition of thin to ultra-thin AlNO films

article

ALD of Ta(Si)N Thin Films Using TDMAS as a Reducing Agent and as a Si Precursor

Advanced time-stamped total data acquisition control front-end for MeV ion beam microscopy and proton beam writing

Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors

scientific article

Alkali-ion irradiated alpha-quartz: low-temperature cathodoluminescence after chemical epitaxy

scientific article

Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et3Si)3As through the GaAs process

article published in 2016

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

scholarly article by Oili M.E. Ylivaara et al published February 2014 in Thin Solid Films

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

scholarly article by Oili M. E. Ylivaara et al published January 2017 in Journal of Vacuum Science & Technology A

Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

scientific article

Analysis of ALD-processed thin films by ion-beam techniques

scientific article

Analysis of thin high-k and silicide films by means of heavy ion time-of-flight forward-scattering spectrometry

Annealing Behaviour of Deuterium in Silicon Doped Carbon Films

scientific article

Antibacterial and barrier properties of oriented polymer films with ZnO thin films applied with atomic layer deposition at low temperatures

Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films

scientific article

Aperture-edge scattering in MeV ion-beam lithography. I. Scattering from a straight Ta aperture edge

article published in 2009

Aperture-edge scattering in MeV ion-beam lithography. II. Scattering from a rectangular aperture

Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applications

scholarly article by Jani Hämäläinen et al published 2011 in Journal of the Electrochemical Society

Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

scholarly article by Aile Tamm et al published 2010 in Journal of the Electrochemical Society

Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films

scholarly article by Kaupo Kukli et al published March 2006 in Chemical Vapor Deposition

Atomic Layer Deposition of Hafnium Dioxide Films Using Hafnium Bis(2-butanolate)bis(1-methoxy-2-methyl-2-propanolate) and Water

article

Atomic Layer Deposition of Hafnium Dioxide Films from 1-Methoxy-2-methyl-2-propanolate Complex of Hafnium

scholarly article by Kaupo Kukli et al published April 2003 in Chemistry of Materials

Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water

scholarly article by Kaupo Kukli et al published March 2004 in Chemical Vapor Deposition

Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

scientific article

Atomic Layer Deposition of High-Permittivity Yttrium-Doped HfO[sub 2] Films

article

Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors

Atomic Layer Deposition of Localized Boron- and Hydrogen-Doped Aluminum Oxide Using Trimethyl Borate as a Dopant Precursor

scientific article

Atomic Layer Deposition of Osmium

scholarly article by Jani Hämäläinen et al published 9 December 2011 in Chemistry of Materials

Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water

scholarly article by V. Pore et al published June 2004 in Chemical Vapor Deposition

Atomic Layer Deposition of Platinum Thin Films

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

scholarly article by Kaupo Kukli et al published 2011 in Journal of the Electrochemical Society

Atomic Layer Deposition of Spinel Lithium Manganese Oxide by Film-Body-Controlled Lithium Incorporation for Thin-Film Lithium-Ion Batteries

Atomic Layer Deposition of SrS and BaS Thin Films Using Cyclopentadienyl Precursors

Atomic Layer Deposition of Strontium Tantalate Thin Films from Bimetallic Precursors and Water

Atomic Layer Deposition of Titanium Nitride Thin Films Using tert-Butylamine and Allylamine as Reductive Nitrogen Sources

scholarly article by Marika Juppo et al published 2002 in Electrochemical and Solid-State Letters

Atomic Layer Deposition of WO3 Thin Films using W(CO)6 and O3 Precursors

Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence

scholarly article by Ville Miikkulainen et al published January 2015 in Journal of Vacuum Science & Technology A

Atomic layer deposition and characterization of biocompatible hydroxyapatite thin films

Atomic layer deposition of Al2O3, ZrO2, Ta2O5, and Nb2O5 based nanolayered dielectrics

Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma

Atomic layer deposition of LixTiyOz thin films

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Atomic layer deposition of Ti-Nb-O thin films onto electrospun fibers for fibrous and tubular catalyst support structures

Atomic layer deposition of calcium oxide and calcium hafnium oxide films using calcium cyclopentadienyl precursor

scholarly article by Kaupo Kukli et al published April 2006 in Thin Solid Films

Atomic layer deposition of ferroelectric LiNbO3

Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

scholarly article by Kaupo Kukli et al published November 2005 in Thin Solid Films

Atomic layer deposition of lithium containing thin films

Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources

scientific article

Atomic layer deposition of polyimide thin films

Atomic layer deposition of rare earth oxides: erbium oxide thin films from β-diketonate and ozone precursors

article published in 2004

Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

scientific article

Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films

Blue- and green-emitting SrS:Cu electroluminescent devices deposited by the atomic layer deposition technique

article

Broadband Ultrahigh-Resolution Spectroscopy of Particle-Induced X Rays: Extending the Limits of Nondestructive Analysis

article

Broadband semiconductor saturable absorber mirrors in the 1.55-μm wavelength range for pulse generation in fiber lasers

scientific article published in April 2002

Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Films

Characterization of 233U alpha recoil sources for 229()Th beam production

scientific article

Characterization of ALD grown Ti x Al y N and Ti x Al y C thin films

Characterization of high and low k dielectrica using low-energy Time of Flight Elastic Recoil Detection

Characterization of surface layers in Zn-diffused LiNbO3 waveguides by heavy ion elastic recoil detection

Chemically guided epitaxy of Rb-irradiated α-quartz

Coating and functionalization of high density ion track structures by atomic layer deposition

Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

scholarly article by Kaupo Kukli et al published September 2002 in Thin Solid Films

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

article

Compositional Characterization of Proton-Exchanged Waveguides in LiNbO 3 by Heavy Ion Elastic Recoil Detection

article

Conceptual study of a heavy-ion-ERDA spectrometer for energies below 6 MeV

article by Jaakko Julin & Timo Sajavaara published September 2017 in Nuclear Instruments & Methods in Physics Research B

Considerations about multiple and plural scattering in heavy-ion low-energy ERDA

Control of Oxygen Nonstoichiometry and Magnetic Property of MnCo2O4Thin Films Grown by Atomic Layer Deposition

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

scientific article published on 01 September 2011

Correction to “Atomic Layer Deposition of Spinel Lithium Manganese Oxide by Film-Body-Controlled Lithium Incorporation for Thin-Film Lithium-Ion Batteries”

scholarly article published in Journal of Physical Chemistry C

Corrosion Protection of Steel with Oxide Nanolaminates Grown by Atomic Layer Deposition

Cover Image

Deposition of yttria-stabilized zirconia thin films by atomic layer epitaxy from β-diketonate and organometallic precursors

Depth profiling of Al2O3+TiO2 nanolaminates by means of a time-of-flight energy spectrometer

article published in 2011

Depth resolution optimization for low-energy ERDA

Detection efficiency of time-of-flight energy elastic recoil detection analysis systems

Determination of molecular stopping cross section of 12C, 16O, 28Si, 35Cl, 58Ni, 79Br, and 127I in silicon nitride

Development Of PIXE Measurement Of Ca Changes Resulting From Viral Transduction In Cells

Development of an MeV ion beam lithography system in Jyväskylä

Development of micro-contact printing of osteosarcoma cells using MeV ion beam lithography

article

Development of the Jyväskylä microbeam facility

Digitizing data acquisition and time-of-flight pulse processing for ToF-ERDA

Direct Writing of Channels for Microfluidics in Silica by MeV Ion Beam Lithography

article published in 2011

Droplet slipperiness despite surface heterogeneity at molecular scale

Dynamics of photoluminescence in GaInNAs saturable absorber mirrors

Editorial

Effect of isotopic substitution on IR and ESR properties of mass selected ion beam deposited ta-C films

Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al 2 O 3

Effect of preparation conditions on properties of atomic layer deposited TiO2 films in Mo–TiO2–Al stacks

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

scholarly article by Kaupo Kukli et al published November 2004 in Journal of Applied Physics

Effect of water dose on the atomic layer deposition rate of oxide thin films

Effective suppression of nanotextured black silicon surface recombination channels by aluminum oxide: comparison from sputtered and ALD grown films

scientific article

Effects of surface roughness on results in elastic recoil detection measurements

Elongation and plasmonic activity of embedded metal nanoparticles following heavy ion irradiation

scientific article published on 14 February 2023

Energy loss and straggling of MeV Si ions in gases

Energy-loss straggling of 2–10 MeV/u Kr ions in gases

scholarly article in European Physical Journal D, vol. 67 no. 7, July 2013

Enhanced growth rate in atomic layer epitaxy deposition of magnesium oxide thin films

scholarly article by Matti Putkonen et al published 2000 in Journal of Materials Chemistry

Epitaxial recrystallization of amorphized α-quartz after sodium ion implantation and oxygen annealing

Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]

scholarly article by Kaupo Kukli et al published May 2005 in Journal of Applied Physics

Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films

article

Evaluation of New Aminoalkoxide Precursors for Atomic Layer Deposition. Growth of Zirconium Dioxide Thin Films and Reaction Mechanism Studies

scholarly article by Raija Matero et al published December 2004 in Chemistry of Materials

Evaluation of a Praseodymium Precursor for Atomic Layer Deposition of Oxide Dielectric Films

scholarly article by Kaupo Kukli et al published November 2004 in Chemistry of Materials

Evidence of quantum phase slip effect in titanium nanowires

article

Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3

Experimental Linear Energy Transfer of Heavy Ions in Silicon for RADEF Cocktail Species

Experimental Linear Energy Transfer of heavy ions in silicon for RADEF cocktail species

Experimental evidence on photo-assisted O− ion production from Al2O3 cathode in cesium sputter negative ion source

scientific article

Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)

Gadolinium oxide thin films by atomic layer deposition

Generalized Noise Study of Solid-State Nanopores at Low Frequencies.

scientific article published on 10 February 2017

Growth of osteoblasts on lithographically modified surfaces

Hafnium silicon oxide films prepared by atomic layer deposition

scholarly article by Kaupo Kukli et al published June 2004 in Materials Science and Engineering B: Advanced Functional Solid-state Materials

Hafnium tetraiodide and oxygen as precursors for atomic layer deposition of hafnium oxide thin films

scholarly article by Jaan Aarik et al published October 2002 in Thin Solid Films

Hardening Mechanisms in Graphitic Carbon Nitride Films Grown with N2/Ar Ion Assistance

Heavy ion induced Ti X-ray satellite structure for Ti, TiN, and TiO2 thin films

HfO[sub 2] Films Grown by ALD Using Cyclopentadienyl-Type Precursors and H[sub 2]O or O[sub 3] as Oxygen Source

scientific article

High quality superconducting titanium nitride thin film growth using infrared pulsed laser deposition

scholarly article by A Torgovkin et al published 13 April 2018 in Superconductor Science and Technology

High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography

Hydrogen and Deuterium Incorporation in ZnO Films Grown by Atomic Layer Deposition

scientific article

H–Li correlation and stoichiometry of mixed phases in proton-exchanged LiNbO[sub 3] waveguides

In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres

scientific article

Influence of Substrate Bias on the Structural and Dielectric Properties of Magnetron-Sputtered BaxSr1-xTiO3Thin Films

article

Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition

Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon

scholarly article by Kaupo Kukli et al published May 2002 in Thin Solid Films

Influence of titanium-substrate roughness on Ca–P–O thin films grown by atomic layer deposition

scholarly article by A.R. Ananda Sagari et al published March 2013 in Thin Solid Films

Investigation Of Multi-Resolution Support For MeV Ion Microscopy Imaging

Investigation of ZrO[sub 2]–Gd[sub 2]O[sub 3] Based High-k Materials as Capacitor Dielectrics

Ion beam mixing in Fe/Si and Ta/Si bilayers: Possible effects of ion charges

Ion-sputtering deposition of Ca–P–O films for microscopic imaging of osteoblast cells

Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures

scholarly article by Jani Hämäläinen et al published 2011 in Journal of Materials Chemistry

Irradiation-induced damage in porous low-k materials during low-energy heavy-ion elastic recoil detection analysis

Linear Energy Transfer of Heavy Ions in Silicon

article published in 2007

Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions

Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

article

Low friction ta-C films with hydrogen reservoirs

article published in 2001

Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants

Low-Temperature Atomic Layer Deposition of Crystalline and Photoactive Ultrathin Hematite Films for Solar Water Splitting

scientific article published on 30 October 2015

Low-Temperature Molecular Layer Deposition Using Monofunctional Aromatic Precursors and Ozone-Based Ring-Opening Reactions.

scientific article

Low-energy heavy-ion TOF-ERDA setup for quantitative depth profiling of thin films

Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils

scientific article published in February 2018

Low-temperature atomic layer deposition of ZnO thin films: Control of crystallinity and orientation

Mass calibration of the energy axis in ToF- E elastic recoil detection analysis

Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition

scientific article

Minimum detection limits and applications of proton and helium induced X-ray emission using transition-edge sensor array

Mobility determination of lead isotopes in glass for retrospective radon measurements.

scientific article

Modification of ALE-grown SrS thin films by ion implantation of Cu and codopants

Monte Carlo simulation of multiple and plural scattering in elastic recoil detection

article published in 2001

Nanorod orientation control by swift heavy ion irradiation

scientific article published on 25 April 2022

Nanoscale Etching of GaAs and InP in Acidic H 2 O 2 Solution: A Striking Contrast in Kinetics and Surface Chemistry

Nanoscale etching of III-V semiconductors in acidic hydrogen peroxide solution: GaAs and InP, a striking contrast in surface chemistry

Nanotribological, nanomechanical and interfacial characterization of atomic layer deposited TiO2 on a silicon substrate

New experimental molecular stopping cross section data of Al2O3, for heavy ions

Normal-Metal–Insulator–Superconductor Tunnel Junction With Atomic-Layer-Deposited Titanium Nitride as Superconductor

scholarly article by Andrii Torgovkin et al published June 2015 in IEEE Transactions on Applied Superconductivity

Nucleation and growth of ZnO on PMMA by low-temperature atomic layer deposition

One-Step Electrodeposition of Cu[sub 2−x]Se and CuInSe[sub 2] Thin Films by the Induced Co-deposition Mechanism

article by Marianna Kemell et al published 2000 in Journal of the Electrochemical Society

Overview of material re-deposition and fuel retention studies at JET with the Gas Box divertor

Oxy-nitrides characterization with a new ERD-TOF system

Ozone-Based Atomic Layer Deposition of Al2 O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation

Phosphites as precursors in atomic layer deposition thin film synthesis

scientific article

Photo-assisted O− and Al− production with a cesium sputter ion source

scientific article

Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

scholarly article by Alexander Pyymaki Perros et al published January 2012 in Journal of Vacuum Science & Technology A

Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films

Porous inorganic–organic hybrid material by oxygen plasma treatment

article

Potku – New analysis software for heavy ion elastic recoil detection analysis

article

Programmable proximity aperture lithography with MeV ion beams

Properties of AlN grown by plasma enhanced atomic layer deposition

Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxides

scholarly article by Helina Seemen et al published 2018 in ECS Journal of Solid State Science and Technology

Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water

scholarly article by Kaupo Kukli et al published 2004 in Journal of the Electrochemical Society

Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

scholarly article by Kaupo Kukli et al published 15 November 2002 in Journal of Applied Physics

Publisher Correction: Droplet slipperiness despite surface heterogeneity at molecular scale

Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films

article published in 2005

Recent negative ion source activity at JYFL

Reduction of Copper Oxide Film to Elemental Copper

scholarly article by P. J. Soininen et al published 2005 in Journal of the Electrochemical Society

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

article published in 2017

Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration

Room‐Temperature Micropillar Growth of Lithium–Titanate–Carbon Composite Structures by Self‐Biased Direct Current Magnetron Sputtering for Lithium Ion Microbatteries

scientific article

Round Robin: measurement of H implantation distributions in Si by elastic recoil detection

Scattering of Ions beyond the Single Scattering Critical Angle in HIERDA

scientific article

Secondary electron flight times and tracks in the carbon foil time pick-up detector

Self-starting stretched-pulse fiber laser mode locked and stabilized with slow and fast semiconductor saturable absorbers

scientific article

Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation

Simulations on time-of-flight ERDA spectrometer performance

scientific article

Solid phase epitaxy of Na-ion irradiated α-quartz: Cathodoluminescence, kinetics and surface morphology

Stability of Si–C films prepared by a pulsed arc discharge method: Thermal treatment and heavy-ion irradiation

Stability, sub-gap current, 1/f-noise, and elemental depth profiling of annealed Al:Mn-AlOX-Al normal metal-insulator-superconducting tunnel junctions

scholarly article by J. K. Julin et al published December 2016 in AIP Advances

Stabilizing organic photocathodes by low-temperature atomic layer deposition of TiO2

article

Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments

scientific article published on 30 September 2019

Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

scholarly article by Mikael Broas et al published July 2016 in Journal of Vacuum Science & Technology A

Studies of impurity deposition/implantation in JET divertor tiles using SIMS and ion beam techniques

Studies on atomic layer deposition of IRMOF-8 thin films

Studies on atomic layer deposition of MOF-5 thin films

Study of thermal stability of nickel silicide by X-ray reflectivity

scholarly article by M. Van Hove et al published December 2005 in Microelectronic Engineering

Surface-controlled growth of LaAlO3 thin films by atomic layer epitaxy

TOF-ERDA spectrometry applied for the analysis of Be migration in (100) GaAs

Tang dynasty (618–907) bowl measured with PIXE

Tert-butylamine and Allylamine as Reductive Nitrogen Sources in Atomic Layer Deposition of TaN Thin Films

The analysis of a thin SiO2/Si3N4/SiO2 stack: A comparative study of low-energy heavy ion elastic recoil detection, high-resolution Rutherford backscattering and secondary ion mass spectrometry

The co-reactant role during plasma enhanced atomic layer deposition of palladium

scientific article published on 17 April 2020

The impact of the density and type of reactive sites on the characteristics of the atomic layer deposited WNxCy films

The production of the new cubic FeN phase by reactive magnetron sputtering

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon

Theαandγplasma modes in plasma-enhanced atomic layer deposition with O2–N2capacitive discharges

Thin film growth into the ion track structures in polyimide by atomic layer deposition

Thin film nanolaminate analysis by simultaneous heavy ion recoil and X-ray spectrometry

Ti Alloyed <i>α</i>-Ga<sub>2</sub>O<sub>3</sub>: Route towards Wide Band Gap Engineering

scientific article published on 20 December 2020

Time-of-flight ERD with a 200mm2 Si3N4 window gas ionization chamber energy detector

Time-of-flight telescope for heavy-ion RBS

Time-of-flight – Energy spectrometer for elemental depth profiling – Jyväskylä design

article by Mikko Laitinen et al published October 2014 in Nuclear Instruments & Methods in Physics Research B

Trajectory bending and energy spreading of charged ions in time-of-flight telescopes used for ion beam analysis

Transition-Edge Sensors for Particle Induced X-ray Emission Measurements

article

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone

article

Using Wave Propagation Simulations and Convolutional Neural Networks to Retrieve Thin Film Thickness from Hyperspectral Images

scientific article

Variation of lattice constant and cluster formation in GaAsBi

article

Wettability and compositional analysis of hydroxyapatite films modified by low and high energy ion irradiation

article

What Determines the Electrochemical Properties of Nitrogenated Amorphous Carbon Thin Films?

scientific article

Why are hydrogen ions best for MeV ion beam lithography?

X-Ray absorption studies of cubic boron–carbon–nitrogen films grown by ion beam assisted evaporation

ZrO2 Thin Films Grown on Silicon Substrates by Atomic Layer Deposition with Cp2Zr(CH3)2 and Water as Precursors

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