List of works - Deirdre L Olynick

20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures [corrected].

scientific article published in November 2003

A route for fabricating printable photonic devices with sub-10 nm resolution ⬇️

scientific article published on January 22, 2013

Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features

scientific article published on 16 July 2018

Complex Materials by Atomic Layer Deposition.

scientific article published on 27 May 2015

Cross-linked Polymer Replica of a Nanoimprint Mold at 30 nm Half-pitch

scientific article published on 01 January 2005

Electrostatic force assisted exfoliation of prepatterned few-layer graphenes into device sites.

scientific article published in January 2009

Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography

article

Formation of bandgap and subbands in graphene nanomeshes with sub-10 nm ribbon width fabricated via nanoimprint lithography

scientific article published on July 2010

Fundamental understanding of chemical processes in extreme ultraviolet resist materials

article

Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

scientific article published on 15 July 2014

High aspect ratio sub-15 nm silicon trenches from block copolymer templates

scientific article published on 20 August 2012

Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalization

scientific article published in July 2005

Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography.

scientific article

Investigation of phonon coherence and backscattering using silicon nanomeshes

scientific article

Low temperature dry etching of chromium towards control at sub-5 nm dimensions

scientific article published on 08 September 2016

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

scientific article published on 27 June 2014

Nanoimprint-induced molecular stacking and pattern stabilization in a solution-processed subphthalocyanine film

scientific article

Nanoscale molecular-switch devices fabricated by imprint lithography

Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale

scientific article published on 01 December 2018

Probe field enhancement in photonic crystals by upconversion nanoparticles

Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning

scientific article published on 16 June 2015

Selectively accessing the hotspots of optical nanoantennas by self-aligned dry laser ablation

scientific article published on 14 September 2020

Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.

scientific article

Super-selective cryogenic etching for sub-10 nm features ⬇️

scientific article published on December 7, 2012

Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses

scientific article

Vapor-Phase Self-Assembled Monolayer for Improved Mold Release in Nanoimprint Lithography

scientific article published on 01 February 2005

List of works by Deirdre L Olynick

20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures [corrected].

A route for fabricating printable photonic devices with sub-10 nm resolution ⬇️

Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features

Complex Materials by Atomic Layer Deposition.

Cross-linked Polymer Replica of a Nanoimprint Mold at 30 nm Half-pitch

Electrostatic force assisted exfoliation of prepatterned few-layer graphenes into device sites.

Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography

Formation of bandgap and subbands in graphene nanomeshes with sub-10 nm ribbon width fabricated via nanoimprint lithography

Fundamental understanding of chemical processes in extreme ultraviolet resist materials

Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

High aspect ratio sub-15 nm silicon trenches from block copolymer templates

Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalization

Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography.

Investigation of phonon coherence and backscattering using silicon nanomeshes

Low temperature dry etching of chromium towards control at sub-5 nm dimensions

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

Nanoimprint-induced molecular stacking and pattern stabilization in a solution-processed subphthalocyanine film

Nanoscale molecular-switch devices fabricated by imprint lithography

Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale

Probe field enhancement in photonic crystals by upconversion nanoparticles

Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning

Selectively accessing the hotspots of optical nanoantennas by self-aligned dry laser ablation

Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.

Super-selective cryogenic etching for sub-10 nm features ⬇️

Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses

Vapor-Phase Self-Assembled Monolayer for Improved Mold Release in Nanoimprint Lithography