PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
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| Description | scientific article published on 24 July 2019 |
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author: David Zanders Anjana Devi Claudia Bock |
| Publication date | July 24, 2019 |
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