Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
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| Description | scientific article published on 01 November 2019 |
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author: Maxim Kozodaev Evgeny Korostylev Andrey Markeev Yury Lebedinskii Cheol Seong Hwang Anastasia Chouprik Anna Chernikova Roman Khakimov |
| Publication date | November 1, 2019 |
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