Thermal Atomic Layer Etching of Silica and Alumina Thin Films Using Trimethylaluminum with Hydrogen Fluoride or Fluoroform
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| Description | scientific article published on 04 September 2018 |
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author: Rezwanur Rahman Eric C Mattson Yves Chabal Joseph P. Klesko |
| Publication date | September 4, 2018 |
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