Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices
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| Description | scientific article published on 09 January 2019 |
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author: David Zanders Christian Hoppe Anjana Devi Detlef Rogalla Lukas Mai Claudia Bock |
| Publication date | January 9, 2019 |
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