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Enhanced Performance of Ge Photodiodes via Monolithic Antireflection Texturing and α-Ge Self-Passivation by Inverse Metal-Assisted Chemical Etching

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Description scientific article published on 06 June 2018
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author: Yuhui Ma  Xin Yin  Xudong Wang  Munho Kim  Jun Li 

Publication date June 6, 2018
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