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Simulation of Titanium Metal/Titanium Dioxide Etching with Chlorine and Hydrogen Chloride Gases Using the ReaxFF Reactive Force Field

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Description scientific article published on June 26, 2013
Author/s

author: Adri van Duin 

Publication date June 26, 2013
Language English
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https://pubs.acs.org/doi/pdf/10.1021/jp4031943

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