Improvement of Gate Dielectric Integrity Using O2 Plasma Treatment Prior to Atomic Layer Deposition on Chemical Vapor Deposition Grown Graphene
| Image |  |
|---|---|
| Description | scientific article published on 01 January 2015 |
| Author/s |
author: Jaehoon Bong |
| Publication date | January 1, 2015 |
| Language | English |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |