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Selective etching of focused gallium ion beam implanted regions from silicon as a nanofabrication method

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Description scientific article published on 11 June 2015
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author: Mikko Ritala  Kenichiro Mizohata  Miika Mattinen  Marko Vehkamäki  Zhongmei Han  Markku Leskela 

Publication date June 11, 2015
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