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Fabrication of high-resolution large-area patterns using EUV interference lithography in a scan-exposure mode

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Description scientific article published on July 10, 2012
Author/s

author: Yasin Ekinci 

Publication date July 10, 2012
Language English
Country of origin
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http://stacks.iop.org/0957-4484/23/i=30/a=305303/pdf

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