Missing/wrong data? Edit Wikidata item
Hafnium oxide and zirconium oxide atomic layer deposition: initial precursor and potential side-reaction product pathways with H/Si(100)-2 x 1
scientific article published on 01 March 2005
Author/s
Work details
Publication date:
March 1, 2005
Language:
English
Country of origin:
Unknown
Copyright status
Copyright status information is not available for this work. The copyright status depends on the jurisdiction, the author's date of death and the date the work was created or published.
To learn more about copyright terms in different countries, visit the countries and terms page.