Missing/wrong data? Edit Wikidata item
Kinetics of dopant incorporation using a low-energy antimony ion beam during growth of Si(100) films by molecular-beam epitaxy
scientific article published on 01 November 1989
Author/s
Work details
Publication date:
November 1, 1989
Language:
English
Country of origin:
Unknown
Copyright status
Copyright status information is not available for this work. The copyright status depends on the jurisdiction, the author's date of death and the date the work was created or published.
To learn more about copyright terms in different countries, visit the countries and terms page.