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Indium Diffusion and Native Oxide Removal during the Atomic Layer Deposition (ALD) of TiO2 Films on InAs(100) Surfaces

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Description scientific article published on August 12, 2013
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author: Theodosia Gougousi 

Publication date August 12, 2013
Language English
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https://pubs.acs.org/doi/pdf/10.1021/am402161f

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