Missing/wrong data? Edit Wikidata item
Atomic Layer Deposition of Tantalum Oxide and Tantalum Silicate from Chloride Precursors
scholarly article by Christoph Adelmann et al published 25 July 2012 in Chemical Vapor Deposition
Author/s
Work details
Publication date:
July 25, 2012
Language:
English
Country of origin:
Unknown
Copyright status
Copyright status information is not available for this work. The copyright status depends on the jurisdiction, the author's date of death and the date the work was created or published.
To learn more about copyright terms in different countries, visit the countries and terms page.