Etching of high aspect ratio features in Si using SF6∕O2∕HBr and SF6∕O2∕Cl2 plasma
| Image |  |
|---|---|
| Description | scientific article published in November 2005 |
| Author/s |
author: Eray S. Aydil |
| Publication date | November 2005 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |