Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing
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| Description | scholarly article by Hector Garcia et al published January 2013 in Journal of Vacuum Science & Technology A |
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author: Helena Castán Joan Marc Rafí Francesca Campabadal Hector Garcia Oihane Beldarrain |
| Publication date | January 2013 |
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