Near-Field Lithography by Two-Photon Induced Photocleavage of Organic Monolayers
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| Description | scientific article published on 15 October 2010 |
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author: Marcus Schmelzeisen Aránzazu del Campo Andreas Best José María Alonso Kaloian Koynov |
| Publication date | October 15, 2010 |
| Language | English |
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