Stimulated oxygen impurity gettering under ultra-shallow junction formation in silicon
| Image |  |
|---|---|
| Description | article by O Oberemok et al published 16 April 2014 in Semiconductor Science and Technology |
| Author/s |
author: Vasyl Kladko |
| Publication date | April 16, 2014 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |