Deposition of Niobium Nitride Thin Films fromTert-Butylamido-Tris-(Diethylamido)-Niobium by a Modified Industrial MOCVD Reactor
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| Description | scholarly article by Tobias B. Thiede et al published December 2009 in Chemical Vapor Deposition |
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author: Harish Parala Roland A Fischer Alberto Gasparotto Davide Barreca |
| Publication date | December 2009 |
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