Growth of lanthanum oxide films for application as a gate dielectric in CMOS technology
| Image |  |
|---|---|
| Description | |
| Author/s |
author: Karol Frohlich Matej Jergel |
| Publication date | January 2004 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |