Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography
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author: Apostolos Avgeropoulos Dipu Borah Konstantinos Ntetsikas |
| Publication date | April 27, 2015 |
| Language | English |
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