PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication
| Image |  |
|---|---|
| Description | article by Ahmed Gharbi et al published September 2015 in Journal of vacuum science and technology. B, Nanotechnology & microelectronics : materials, processing, measurement, & phenomena : JVST B |
| Author/s |
author: Raluca Tiron |
| Publication date | September 2015 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |