Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors
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| Description | scholarly article by Anjana Devi et al published 9 June 2010 in Chemical Vapor Deposition |
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author: Hans-Werner Becker Harish Parala Roland A Fischer Reji Thomas Davide Barreca |
| Publication date | June 9, 2010 |
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