MOCVD of TiO2Thin Films using a Heteroleptic Titanium Complex: Precursor Evaluation and Investigation of Optical, Photoelectrochemical and Electrical Properties
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| Description | scholarly article by Manish Banerjee et al published 25 July 2014 in Chemical Vapor Deposition |
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author: Van-Son Dang Martina Havenith-Newen Hans-Werner Becker Detlef Rogalla Andreas D. Wieck |
| Publication date | July 25, 2014 |
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