Atomic Layer Deposition of HfO2 Thin Films Employing a Heteroleptic Hafnium Precursor
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| Description | scholarly article by Ke Xu et al published March 2012 in Chemical Vapor Deposition |
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author: Hans-Werner Becker Detlef Rogalla Harish Parala Ulrich Kunze Christian Wenger |
| Publication date | March 2012 |
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