Aqueous Solutions for Low-Temperature Photoannealing of Functional Oxide Films: Reaching the 400 °C Si-Technology Integration Barrier
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| Description | scientific article published on 01 August 2011 |
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author: Ricardo Jiménez Iñigo Bretos Jesús Ricote Marlies Van Bael M. Lourdes Calzada |
| Publication date | August 1, 2011 |
| Language | English |
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