Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen
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| Description | scholarly article by Kaupo Kukli et al published 15 November 2002 in Journal of Applied Physics |
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author: Timo Sajavaara Mikko Ritala Anders Hårsta Jonas Sundqvist Kaupo Kukli Markku Leskela |
| Publication date | November 15, 2002 |
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