Hafnium tetraiodide and oxygen as precursors for atomic layer deposition of hafnium oxide thin films
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| Description | scholarly article by Jaan Aarik et al published October 2002 in Thin Solid Films |
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author: Timo Sajavaara Anders Hårsta Jonas Sundqvist Kaupo Kukli |
| Publication date | October 2002 |
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