Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water
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| Description | scholarly article by Kaupo Kukli et al published 2004 in Journal of the Electrochemical Society |
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author: Timo Sajavaara Mikko Ritala Kaupo Kukli Philip J. Tobin David Gilmer Markku Leskela |
| Publication date | 2004 |
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