Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films
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| Description | scholarly article by Kaupo Kukli et al published November 2004 in Journal of Applied Physics |
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author: Timo Sajavaara Mikko Ritala Anders Hårsta Jonas Sundqvist Kaupo Kukli Aleks Aidla Teet Uustare Markku Leskela |
| Publication date | November 2004 |
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