Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]
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| Description | scholarly article by Kaupo Kukli et al published May 2005 in Journal of Applied Physics |
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author: Timo Sajavaara Mikko Ritala Anders Hårsta Jonas Sundqvist Kaupo Kukli Aleks Aidla Teet Uustare Markku Leskela |
| Publication date | May 2005 |
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