Search filters

Excellent silicon surface passivation using dimethylaluminium chloride as Al source for atomic layer deposited Al2O3

Image Image of a generic work. The text above it indicates that there is no free image of the work available, and that if you own one, you can click on the placeholder link to upload it.
Description
Author/s

author: Yameng Bao  Hele Savin  Timo Sajavaara  Matti Putkonen  Mikko Laitinen 

Publication date March 16, 2015
Language
Country of origin
Wikipedia link
Copyright status
Missing/wrong data? Edit Wikidata item