Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
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| Description | scholarly article by Alexander Pyymaki Perros et al published January 2012 in Journal of Vacuum Science & Technology A |
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author: Timo Sajavaara Mikko Laitinen Alexander Pyymaki Perros Harri Lipsanen Markus Bosund Teppo Huhtio |
| Publication date | January 2012 |
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