Publisher's Note: “Optimal Ge/SiGe nanofin geometries for hole mobility enhancement: Technology limit from atomic simulations” [J. Appl. Phys. 117, 174312 (2015)]
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author: Tillmann Kubis Gerhard Klimeck Michael Povolotskyi Alejandro Strachan |
| Publication date | July 7, 2015 |
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