Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).
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| Description | scientific article published on 7 July 2016 |
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author: Adrian Keller Horst Fischer Ignacio Giner |
| Publication date | July 7, 2016 |
| Language | English |
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