Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm.
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| Description | scientific article published in January 2018 |
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author: Carsten Rockstuhl Toralf Scharf Reinhard Voelkel Wilfried Noell Raoul Kirner |
| Publication date | January 1, 2018 |
| Language | English |
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| Missing/wrong data? | Edit Wikidata item |