Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
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| Description | scientific article published on 19 March 2018 |
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author: Marcel A Verheijen Adriana Szeghalmi Saurabh Karwal Wilhelmus M. M. Kessels Tahsin Faraz |
| Publication date | April 9, 2018 |
| Language | English |
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