Surface etching, chemical modification and characterization of silicon nitride and silicon oxide--selective functionalization of Si3N4 and SiO2.
| Image |  |
|---|---|
| Description | scientific article published on 12 February 2016 |
| Author/s |
author: Mathew D. Halls Yves Chabal Han Zuilhof |
| Publication date | February 12, 2016 |
| Language | |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |