Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes.
| Image |  |
|---|---|
| Description | scientific article published on 7 November 2016 |
| Author/s |
author: Edward T. Yu Allen J. Bard Hsien-Yi Hsu |
| Publication date | November 7, 2016 |
| Language | English |
| Country of origin | |
| Wikipedia link | |
| Copyright status | |
| Missing/wrong data? | Edit Wikidata item |