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The effect of a Ta oxygen scavenger layer on HfO2-based resistive switching behavior: thermodynamic stability, electronic structure, and low-bias transport

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Description scientific article published on 23 February 2016
Author/s

author: Olle Heinonen  Yoshihiro Asai  Hisao Nakamura 

Publication date February 23, 2016
Language English
Country of origin
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https://archive.org/details/arxiv-1602.06793

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