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Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O.

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Description scientific article published on 12 December 2016
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author: Deok-Yong Cho  Cheol Seong Hwang  Sang Woon Lee  Sanjeev Gautam 

Publication date December 20, 2016
Language English
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