Low-Temperature Wet Conformal Nickel Silicide Deposition for Transistor Technology through an Organometallic Approach
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| Description | scientific article published on 12 January 2017 |
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author: Chih-Jen Shih Dmitri Yu Zemlyanov Jakub Jagielski Tigran Margossian Christophe Copéret Tsung-Han Lin Sudhir Kumar |
| Publication date | January 12, 2017 |
| Language | English |
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